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Sputtering targets and sputtered atoms transport Computer simulation
22:427. Huang ZQ,[link widoczny dla zalogowanych], Ding E. Transport theory [M]. Beijing. Science Press, 1987. NakanoT, BabaS. [J]. Vacuum,[link widoczny dla zalogowanych], 1998. 51 (4): 485. Li Yang Ping, Liu Zhengtang. [J]. Functional Materials and Devices,[link widoczny dla zalogowanych], 2002,8 (3). 309. ZieglerJF,[link widoczny dla zalogowanych], BiersaekJP. LittmarkU. TheStoppingandRangeofIonsinSolids [M]. NewYorklPergamonPress. 1985. SomekhRE. [J]. JVaeSciTeehnol,[link widoczny dla zalogowanych], 1984. A2 (3) l1285. RobinsonRs. [J]. JVaeSciTeehnol, 1979,16 (2): 185. [1] Wang thick. Interaction with the solid particles physics (Volume) [M]. Beijing: Science Press ComputersimulationofsputteringoftargetandtranspOrtatiOnOfsputteredatomsLIYang-ping, LIUZheng-tang, GENGDong-sheng (DepartmentofMaterialsScienceandEngineering.NorthwesternPolytechnicalUniversity.Xian710072.China) Abstract: SputteringoftargetandtransportationofsputteredatomsaresimulatedwithsoftwareSRIMandMonteCarlomethod. Theresultsofsimulationincludeenergies. incidenceanglesandpositionsofsputteredatomsonarrivingsubstrate. Itcanbegetthattrans-portationofsputteredatomsisaffectedgreatlybyP × d (Pisgaspressureinvacuum, disdistancebetweentargetandsubstrate), thebiggerthevalueofP × d. thefewerthenumberofatomsarrivingsubstrate. andthesmallertheenergiesofthem: TheenergiesofsputteredatomsonarrivingsubstrateconcentrateuponseveraleVwithanotherdistributionpeakinverylowenergyarea; Angledistributionconcentratesupontheverticaldirection. whichwasasthatofatomssputteredfromthetarget, butwasreducedintom-parison; Incidencepositiondistributionbecomesmoreuniformandthedistributionareaextendsinradialdirectioncomparedwiththoseofatomswhensputteredfromtarget. Incidencepositiondistributionwaslimitedwithintherangeoftargetradius. Keywords: computersimulation; sputtering; transportation; sputteredatom
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